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Proceedings Paper

New measuring technique of complex index of immersion liquids
Author(s): Jean-Louis Stehlé; Jean-Philippe Piel; Jose Campillo-Carreto
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Paper Abstract

The next nodes in immersion lithography will require to use the 193 nm laser line with very large numerical aperture and a liquid between the optics and the resist1. Immersion lithography at 193 nm requests very specific parameters for the fluid. The first generation will use the De-Ionized Water (DIW) very pure and not recycled, but when a new optical material for last lens will be available with a refractive index (RI) larger than 1.85, a higher refractive index fluid can be used, enabling second and maybe third generation of immersion lithography at 193 nm. So the 45 and maybe the 32 nm nodes could be covered with this High Index Fluids (HIF).

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615233 (24 March 2006); doi: 10.1117/12.657410
Show Author Affiliations
Jean-Louis Stehlé, SOPRA (France)
Jean-Philippe Piel, SOPRA (France)
Jose Campillo-Carreto, SOPRA (France)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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