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Proceedings Paper

First performance results of the ASML alpha demo tool
Author(s): Hans Meiling; Henk Meijer; Vadim Banine; Roel Moors; Rogier Groeneveld; Harm-Jan Voorma; Uwe Mickan; Bas Wolschrijn; Bas Mertens; Gregor van Baars; Peter Kürz; Noreen Harned
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Paper Abstract

The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.

Paper Details

Date Published: 22 March 2006
PDF: 12 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615108 (22 March 2006); doi: 10.1117/12.657348
Show Author Affiliations
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Henk Meijer, ASML Netherlands B.V. (Netherlands)
Vadim Banine, ASML Netherlands B.V. (Netherlands)
Roel Moors, ASML Netherlands B.V. (Netherlands)
Rogier Groeneveld, ASML Netherlands B.V. (Netherlands)
Harm-Jan Voorma, ASML Netherlands B.V. (Netherlands)
Uwe Mickan, ASML Netherlands B.V. (Netherlands)
Bas Wolschrijn, TNO (Netherlands)
Bas Mertens, TNO (Netherlands)
Gregor van Baars, Philips Applied Technology (Netherlands)
Peter Kürz, Carl Zeiss SMT AG (Germany)
Noreen Harned, ASML Wilton (United States)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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