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Proceedings Paper

Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM
Author(s): Yusuke Teramoto; Gohta Niimi; Daiki Yamatani; Yuki Joshima; Kazunori Bessho; Takahiro Shirai; Tetsu Takemura; Toshio Yokota; Hironobu Yabuta; Khokan C. Paul; Kiyoyuki Kabuki; Koji Miyauchi; Mitsuru Ikeuchi; Kazuaki Hotta; Masaki Yoshioka; Hiroto Sato
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Paper Abstract

Discharge-produced plasma (DPP) based EUV source is being developed at Gotenba Branch of EUVA Hiratsuka R&D Center. Among the several kinds of discharge scheme, Z-pinch is employed in our source. An all-solid-state magnetic pulse compression (MPC) generator is used to create a Z-pinch plasma. Low inductance MPC generator is capable of producing a pulsed current with over 50 kA of peak amplitude and about 100 ns of pulse duration at 7 kHz of pulse repetition frequency. In order to obtain sufficient output radiation power, tin-containing gas is being used as well as xenon. Due to the high spectral efficiency of tin, demonstrated EUV output power reached 645 W/2πsr within 2% bandwidth around 13.5 nm. A novel scheme of fuel gas supply led to as good output energy stability as xenon can achieve. Using a nested grazing-incidence collector, EUV power at intermediate focus point which is defined as an interface to the exposure tool reached 42 W with 3.3 mm2sr of etendue.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615147 (24 March 2006); doi: 10.1117/12.657272
Show Author Affiliations
Yusuke Teramoto, Extreme Ultraviolet Lithography System Development Association (Japan)
Gohta Niimi, Extreme Ultraviolet Lithography System Development Association (Japan)
Daiki Yamatani, Extreme Ultraviolet Lithography System Development Association (Japan)
Yuki Joshima, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazunori Bessho, Extreme Ultraviolet Lithography System Development Association (Japan)
Takahiro Shirai, Extreme Ultraviolet Lithography System Development Association (Japan)
Tetsu Takemura, Extreme Ultraviolet Lithography System Development Association (Japan)
Toshio Yokota, Extreme Ultraviolet Lithography System Development Association (Japan)
Hironobu Yabuta, Extreme Ultraviolet Lithography System Development Association (Japan)
Khokan C. Paul, Ushio Inc. (Japan)
Kiyoyuki Kabuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Koji Miyauchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Mitsuru Ikeuchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazuaki Hotta, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Yoshioka, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroto Sato, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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