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Proceedings Paper

UV-nanoimprint lithography using a diamond-like carbon stamp
Author(s): Jun-ho Jeong; Ki-don Kim; Young-suk Sim; Dae-geun Choi; Eung-sug Lee; Sang-hu Park; Tae-woo Lim; Dong-yol Yang
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Paper Abstract

Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography (UV-NIL) were fabricated with two methods: namely, two-photon polymerization (TPP) patterning, followed by nanoscale-thick DLC coating; and a fluorine-doped (F-DLC) coating process, followed by O2 plasma etching. The DLC layer on top of polymer pattern or flat quartz substrate was formed using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) process or Direct current (DC) and radio frequency (RF) magnetron sputtering process. It was also demonstrated that the DLC stamp with no anti-adhesion layer could be used for imprinting wafers on UV-NIL and the dimensions of the stamp's features correlated well with the corresponding imprinted features.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512J (24 March 2006); doi: 10.1117/12.657132
Show Author Affiliations
Jun-ho Jeong, Korea Institute of Machinery and Materials (South Korea)
Ki-don Kim, Korea Institute of Machinery and Materials (South Korea)
Young-suk Sim, Korea Institute of Machinery and Materials (South Korea)
Dae-geun Choi, Korea Institute of Machinery and Materials (South Korea)
Eung-sug Lee, Korea Institute of Machinery and Materials (South Korea)
Sang-hu Park, Korea Advanced Institute of Science and Technology (South Korea)
Tae-woo Lim, Korea Advanced Institute of Science and Technology (South Korea)
Dong-yol Yang, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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