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Proceedings Paper

Magnetic field ion mitigation for xenon-based laser-plasma EUV source
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Proc. SPIE 6151, Emerging Lithographic Technologies X, ; doi: 10.1117/12.657039
Show Author Affiliations
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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