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Proceedings Paper

Resolution enhancement technology using an apodization theory application
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Proc. SPIE 6154, Optical Microlithography XIX, 615427; doi: 10.1117/12.656984
Show Author Affiliations
Seung-Wook Park, Hanyang Univ. (South Korea)
Seong-Bo Shim, Seoul National Univ. (South Korea)
Na-Rak Choi, Seoul National Univ. (South Korea)
Jai-Soon Kim, Seoul National Univ. (South Korea)
Hye Keun Oh, Hanyang Univ. (South Korea)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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