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Proceedings Paper

Lithography performance improvement for 65-nm node contact-hole patterning from changing different chemical natures
Author(s): Cheng-Han Wu
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Date Published:
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Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615339; doi: 10.1117/12.656933
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Cheng-Han Wu, United Microelectronics Corp. (Taiwan)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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