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Proceedings Paper

Predictive focus exposure modeling (FEM) for full-chip lithography
Author(s): Luoqi Chen; Yu Cao; Hua-yu Liu; Wenjin Shao; Mu Feng; Jun Ye
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Paper Abstract

To minimize or eliminate lithography errors associated with optical proximity correction, integrated circuit manufacturers need an accurate, predictive, full-chip lithography model which can account for the entire process window (PW). We have validated the predictive power of a novel focus-exposure modeling methodology with wafer data collected across the process window at multiple customer sites. Tachyon Focus-Exposure Modeling (FEM) first-principle, physics-driven simulations deliver accurate and predictive full-chip lithography modeling for producing state-of-the-art circuits.

Paper Details

Date Published: 15 March 2006
PDF: 9 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61541T (15 March 2006); doi: 10.1117/12.656891
Show Author Affiliations
Luoqi Chen, Brion Technologies, Inc. (United States)
Yu Cao, Brion Technologies, Inc. (United States)
Hua-yu Liu, Brion Technologies, Inc. (United States)
Wenjin Shao, Brion Technologies, Inc. (United States)
Mu Feng, Brion Technologies, Inc. (United States)
Jun Ye, Brion Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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