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Proceedings Paper

Benchmark of numerical versus analytical proximity curve calculations
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Paper Abstract

For the technology development of microlithography various optical simulation tools are established as a planning and development tool. Depending on the application, various numerical approximation schemes are used to tradeoff accuracy versus speed. Determining the correct numerical setting is often a tricky task as it is a compromise between these two contrary properties. In our study, we compare the numerical accuracy of two optical simulators, Solid-E as a representative for simulators for technology development and Mentor Calibre as design-for-manufacturing and optical proximity correction (OPC) tool. Calibre uses a coherent kernel approximation for performing fast simulations. As a measure for the simulation accuracy, we use the root-mean-square error criterion of a linearity curve compared to an analytical reference simulation.

Paper Details

Date Published: 20 March 2006
PDF: 14 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61542Q (20 March 2006); doi: 10.1117/12.656884
Show Author Affiliations
Roderick Köhle, Infineon Technologies AG (Germany)
Christof Bodendorf, Infineon Technologies AG (Germany)
Wolfgang Hoppe, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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