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Proceedings Paper

Optical anisotropy approach in spectroscopic ellipsometry to determine the CD of contact hole patterns
Author(s): Jaisun Kyoung; Hyuknyeong Cheon; Sangbin Noh; Jongkyu Cho; Ilsin An; Sukjoo Lee; Hangu Cho
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Paper Abstract

We applied spectroscopic ellipsometry for possible determination of the size of contact holes. We fabricated contact hole patterns in two dimensional array to increase sensitivity and the size of contact hole varied from 80 to 150 nm. Variation of hole-diameter in few nm was distinguishable by comparing the features in ellipsometry parameter Δ, Ψ or the degree of polarization spectra. These features could be used to estimate the size of contact holes once they were calibrated by other techniques. When the photoresist film with dense contact hole pattern was regarded as a uniaxial material, the ellipsometry spectra could be analyzed with anisotropic optical model. In the process, the average size of contact hole could be estimated from the anisotropy of the film.

Paper Details

Date Published: 15 March 2006
PDF: 11 pages
Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 61550L (15 March 2006); doi: 10.1117/12.656875
Show Author Affiliations
Jaisun Kyoung, Hanyang Univ. (South Korea)
Hyuknyeong Cheon, Hanyang Univ. (South Korea)
Sangbin Noh, Hanyang Univ. (South Korea)
Jongkyu Cho, Hanyang Univ. (South Korea)
Ilsin An, Hanyang Univ. (South Korea)
Sukjoo Lee, Samsung Electronics Co., Ltd. (South Korea)
Hangu Cho, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 6155:
Data Analysis and Modeling for Process Control III
Iraj Emami; Kenneth W. Tobin, Editor(s)

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