Share Email Print
cover

Proceedings Paper

Development of multi-function hard mask to simplify process step
Author(s): Kilyoung Lee; Samyoung Kim; Geunsu Lee; Sungkwon Lee; Junhee Cho; Wonkyu Kim; Cheolkyu Bok; Hyeongsoo Kim; Seungchan Moon; Jinwoong Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

ArF lithography has been driven into sub-100 nm dimensions using high numerical apertures, phase-shift mask, modified illumination, and optical proximity correction. As feature size continues to shrink, photoresist thickness as an imaging layer has been decreased for the improvement of lithographic process window and pattern collapse margin. Moreover, ArF photoresist has the inherent demerit of poor etch resistance in comparison with KrF photoresist and we have to use inorganic hard mask materials such as silicon-nitride, -oxide, poly-silicon, and silicon oxynitride as a pattern transfer layer. The cost-of-ownership (COO) of CVD process related to the application of inorganic hard mask is much more expensive than that of spin-on process. Therefore, several processes including bi-layer resist process (BLR), and tri-layer resist process (TLR)1 have been investigated. This paper will focus on TLR process consisted of multi-function hard mask (MFHM) material and spin on carbon (SOC) material.

Paper Details

Date Published: 11 April 2006
PDF: 8 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61532V (11 April 2006); doi: 10.1117/12.656870
Show Author Affiliations
Kilyoung Lee, Hynix Semiconductor Inc. (South Korea)
Samyoung Kim, Hynix Semiconductor Inc. (South Korea)
Geunsu Lee, Hynix Semiconductor Inc. (South Korea)
Sungkwon Lee, Hynix Semiconductor Inc. (South Korea)
Junhee Cho, Hynix Semiconductor Inc. (South Korea)
Wonkyu Kim, Hynix Semiconductor Inc. (South Korea)
Cheolkyu Bok, Hynix Semiconductor Inc. (South Korea)
Hyeongsoo Kim, Hynix Semiconductor Inc. (South Korea)
Seungchan Moon, Hynix Semiconductor Inc. (South Korea)
Jinwoong Kim, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

© SPIE. Terms of Use
Back to Top