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Proceedings Paper

Effects of laser bandwidth on OPE in a modern lithography tool
Author(s): Kevin Huggins; Toki Tsuyoshi; Meng Ong; Robert Rafac; Christopher Treadway; Devashish Choudhary; Takehito Kudo; Shigeru Hirukawa; Stephen P. Renwick; Nigel R. Farrar
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Paper Abstract

The OPE signature of a lithographic stepper or scanner has become a very important characteristic of the tool, as it determines the OPC correction to be applied to reticles exposed on that tool. The signature depends on a variety of detailed information about the scanner lens and illuminator, which in turn depend on the characteristics of the illumination light from the laser. Specifically, changes in the laser bandwidth should impact OPE as the lens exhibits some chromatic aberration. Tool-to-tool differences and time fluctuation of the laser bandwidth could cause variations in OPE tool matching and stability. To assess this, a detailed study of laser bandwidth effects on OPE was performed. A sensitive spectrometer was connected to a litho laser, allowing careful measurements of both the FWHM and E95 parameters of the laser spectral profile. Lithographic modeling using the chromatic response of the lens was run in order to predict effects. Exposures of CD through pitch were made to test the modeling. Finally, the bandwidth data was correlated with litho sensitivity to create a "bandwidth effect", put in context with the other common scanner parameters affecting OPE.

Paper Details

Date Published: 15 March 2006
PDF: 12 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61540Z (15 March 2006); doi: 10.1117/12.656816
Show Author Affiliations
Kevin Huggins, Intel Corp. (United States)
Toki Tsuyoshi, Nikon Corp. (Japan)
Meng Ong, Nikon Precision, Inc. (United States)
Robert Rafac, Cymer Inc. (United States)
Christopher Treadway, Intel Corp. (United States)
Devashish Choudhary, Intel Corp. (United States)
Takehito Kudo, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)
Stephen P. Renwick, Nikon Precision, Inc. (United States)
Nigel R. Farrar, Cymer Inc. (United States)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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