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Proceedings Paper

Defining the role of SEM metrology for advanced process control
Author(s): A. Nikitin; A. Sicignano; D. Yeremin; M. Sandy; T. Goldburt
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Paper Abstract

The problem of enacting an effective Advanced Process Control (APC) system is herein discussed [1]. The schematic structure of the system is represented below: (please see manuscript). The creation of such a system with a communication link between the mask designer and lithography and process engineering of consequent operations can be broken down into two problems: 1. Organization of the interaction of services performed by APC. 2. Reliability of the measurement information obtained in SEM CD metrology. We will focus on the second problem. The effectiveness of the operation of the APC system depends on the reliability (precision and accuracy) of the measurement outcomes.

Paper Details

Date Published: 24 March 2006
PDF: 7 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523I (24 March 2006); doi: 10.1117/12.656701
Show Author Affiliations
A. Nikitin, Nanometrology LLC (United States)
A. Sicignano, Nanometrology LLC (United States)
D. Yeremin, Nanometrology LLC (United States)
M. Sandy, Nanometrology LLC (United States)
T. Goldburt, Nanometrology LLC (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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