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Proceedings Paper

Benchmark comparison of multiple process control strategies for lithographic CD control
Author(s): Wei Kang; John Mao
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Paper Abstract

In this paper, we present a study on the robustness comparison of several process feedbacks controllers. The feedbacks include those based on either EWMA or Kalman Filter estimation. In addition, a new multiple dimension feedback controller is introduced, which has a significantly improved robust stability and reduced sensitivity to unknown noise. In the robustness study, we assume model mismatch and unknown disturbances. Two issues of robustness are addressed in this paper, namely the region of model mismatch in which a process feedback is stable; and the H-infinity gain of the controlled process from unknown noise to the system performance. Simulations are shown to compare the performance of the feedbacks under model mismatch, system drifting, and random noise.

Paper Details

Date Published: 24 March 2006
PDF: 12 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520E (24 March 2006); doi: 10.1117/12.656684
Show Author Affiliations
Wei Kang, Naval Postgraduate School (United States)
John Mao, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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