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Proceedings Paper

Improved model forms for better model accuracy and stability
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Proc. SPIE 6154, Optical Microlithography XIX, ; doi: 10.1117/12.656643
Show Author Affiliations
Alexandra C. Barberet, IBM Microelectronics Div. (United States)
Alan E. Rosenbluth, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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