Share Email Print

Proceedings Paper

Real-time on-line monitoring of process water for low concentrations of bacteria
Author(s): John A. Adams; David McCarty; Kristina Crousore
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Naturally occurring outbreaks of bacteria have the potential to contaminate process water used in semiconductor manufacturing. Bacteria are normally filtered out in the water treatment process, however contamination can still occur from biofilm growth, filter or media break-through, and air vectors. Because there is seldom a residual disinfectant and system sanitation is intermittent, the manufacturer must rely on point of use filters to prevent contamination at critical points in the process. Particle counters in the distribution system can tell when the number of particles is increasing but cannot discriminate bacteria from small silica particles and often are unable to detect smaller gram-negative particles. If an on-line multi-angle light scattering system is used in place of particle counters or in conjunction with them, then the discrimination between silica particles and bacteria can be made and the proper action taken in the distribution system to help identify the contamination source, improve preventative maintenance, and ultimately increase yields. This paper describes the multi-angle light scattering method of detecting bacteria with the BioSentryTM system to provide an effective real-time on-line water monitoring sensor.

Paper Details

Date Published: 24 March 2006
PDF: 6 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523M (24 March 2006); doi: 10.1117/12.656627
Show Author Affiliations
John A. Adams, JMAR Technologies (United States)
David McCarty, JMAR Technologies (United States)
Kristina Crousore, JMAR Technologies (United States)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top