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Proceedings Paper

Increased yield and tool life by reduction of DUV photo contamination using parts-per-trillion pure purge gases
Author(s): Cristian Landoni; Marco Succi; Larry Rabellino
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Paper Abstract

This paper describes some of the results collected during the study of improved purification materials, qualification of regenerability performances and newly developed ways to detect Acids, Bases and Siloxanes at the sub-ppt levels. Removal validation down to single ppt levels has been demonstrated for several impurities such as: NH3, SO2 and Hexamethyldisiloxane (HMDSO).

Paper Details

Date Published: 24 March 2006
PDF: 10 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523K (24 March 2006); doi: 10.1117/12.656623
Show Author Affiliations
Cristian Landoni, SAES Getters S.p.A. (Italy)
Marco Succi, SAES Getters S.p.A. (Italy)
Larry Rabellino, SAES Pure Gas Inc. (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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