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Proceedings Paper

Next steps for tin EUV-source optics development
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Date Published:
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Proc. SPIE 6151, Emerging Lithographic Technologies X, 61511S; doi: 10.1117/12.656601
Show Author Affiliations
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)
Martin John Neumann, Univ. of Illinois at Urbana-Champaign (United States)
Huatan Qiu, Univ. of Illinois at Urbana-Champaign (United States)
Michael A. Jaworski, Univ. of Illinois at Urbana-Champaign (United States)
Keith C. Thompson, Univ. of Illinois at Urbana-Champaign (United States)
Joshua B. Spencer, Univ. of Illinois at Urbana-Champaign (United States)
Hyung Joo Shin, Univ. of Illinois at Urbana-Champaign (United States)
Erik L. Antonsen, Univ. of Illinois at Urbana-Champaign (United States)
Darren A. Alman, Univ. of Illinois at Urbana-Champaign (United States)
Brian E. Jurczyk, Univ. of Illinois at Urbana-Champaign (United States)
Robert L. Bristol, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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