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Proceedings Paper

EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution
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Paper Abstract

We have acquired images with sub-38 nm spatial resolution using a tabletop extreme ultraviolet (EUV) imaging system operating at a wavelength of 13.2 nm, which is within the bandwidth of Mo/Si lithography mirrors This zone plate-based, full-field microscope has the power to render images in only several seconds with up to a 10,000 μm2 field of view. The ability to acquire such high-resolution images using a compact EUV plasma laser source opens many possibilities for nanotechnology, including in-house actinic inspection of EUV lithography mask blanks.

Paper Details

Date Published: 23 March 2006
PDF: 7 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510X (23 March 2006); doi: 10.1117/12.656588
Show Author Affiliations
Georgiy Vaschenko, Colorado State Univ. (United States)
Fernando Brizuela, Colorado State Univ. (United States)
Courtney Brewer, Colorado State Univ. (United States)
Miguel A. Larotonda, Colorado State Univ. (United States)
Yong Wang, Colorado State Univ. (United States)
Bradley M. Luther, Colorado State Univ. (United States)
Mario C. Marconi, Colorado State Univ. (United States)
Jorge J. Rocca, Colorado State Univ. (United States)
Carmen S. Menoni, Colorado State Univ. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)
Yanwei Liu, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)
David T. Attwood, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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