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Proceedings Paper

Line-width roughness analysis of EUV resists after development in homogenous CO2 solutions using CO2 compatible salts (CCS) by a three-parameter model
Author(s): Vassilios Constantoudis; Evangelos Gogolides; George P. Patsis; Mark Wagner; James DeYoung; Chris Harbinson
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Paper Abstract

Line Width Roughness (LWR) of resists constitutes one of the main obstacles in the race of further shrinking the feature dimensions of fabricated devices. Thus, the reduction and control of LWR is one of the biggest challenges of next generation lithographies. In this paper, the LWR output of a new development process of EUV resists which uses homogeneous carbon dioxide (CO2) solutions containing CO2 compatible salts (CCS) has been examined. The measurement and characterization of LWR has been made through the analysis of CD-SEM images and the application of a three-parameter model. The three parameters involved in this model (sigma value σLWR, correlation length ξ, roughness exponent α) determine both the spatial aspects (spectrum) of LWR as well as the interplay between LWR and local CD variations. It is found that wafers developed with CCS process gives substantially lower LWR parameters (σLWR,ξ) than comparable TMAH developed samples. Also, the impact of the preparation of resist wafer (exposure time, PAG and quencher level) and the development conditions (temperature, CCS concentration) on LWR parameters is examined so that we are able to identify trends to lead toward optimized LWR performance.

Paper Details

Date Published: 11 April 2006
PDF: 10 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533W (11 April 2006); doi: 10.1117/12.656579
Show Author Affiliations
Vassilios Constantoudis, Institute of Microelectronics, NCSR, Demokritos (Greece)
Evangelos Gogolides, Institute of Microelectronics, NCSR, Demokritos (Greece)
George P. Patsis, Institute of Microelectronics, NCSR, Demokritos (Greece)
Mark Wagner, Micell Integrated Systems (United States)
James DeYoung, Micell Integrated Systems (United States)
Chris Harbinson, Micell Integrated Systems (United States)

Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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