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Proceedings Paper

Laser bandwidth and other sources of focus blur in lithography
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Paper Abstract

It is well known that the refractive optics used in today's exposure tools are highly chromatic, meaning that small wavelength shifts will cause large focus shifts. Even a line-narrowed excimer laser has a large enough range of wavelengths that we can no longer think of an infinitely thin image plane. The concept of "focus blur" can be generalized to encompass the effect of laser bandwidth chromatic aberrations, vertical stage vibrations (MSDz) and stage tilts which cause focus to change during the scan. This paper will introduce a new parameter called Mean Absolute Defocus (MAD) that can characterize the focus blur, and will be shown to correlate with the lithographic effects. Focus blur can be incorporated into simulation models, in a manner similar to the way that stage vibration is modeled. New simulation results will illustrate the impact of focus blur on modern lithographic processes. Process stability and machine-to-machine matching issues will be discussed.

Paper Details

Date Published: 15 March 2006
PDF: 8 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61540V (15 March 2006); doi: 10.1117/12.656520
Show Author Affiliations
T. Brunner, IBM Semiconductor Research and Development Ctr. (United States)
D. Corliss, IBM Semiconductor Research and Development Ctr. (United States)
S. Butt, IBM Semiconductor Research and Development Ctr. (United States)
T. Wiltshire, IBM Semiconductor Research and Development Ctr. (United States)
C. P. Ausschnitt, IBM Semiconductor Research and Development Ctr. (United States)
M. Smith, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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