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Proceedings Paper

Fabrication of organic nanoparticles by PRINT: Master generation using lithographic and RIE techniques
Author(s): Ashish A. Pandya; Benjamin W. Maynor; Stephanie E. A. Gratton; David G. Vellenga; D. Ginger Yu; Carlton M. Osburn; Joseph M. DeSimone
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Paper Abstract

By using PRINT (Particle Replication In Non-wetting Templates), a general soft technique for replication of diverse shapes at the sub-micron level, we have been able to produce organic nano-particles. Lithographic patterning (using 193nm exposure tool) was employed to generate 160nm posts on a 6" Si wafer; the material of the posts being the organic polymer based commercial photoresist. RIE was then performed on the patterned substrate to transfer the geometry to the Si; various aspect ratios of the Si nano-posts were obtained upon etch time variation. PRINT was used to make a mold of the nano-features on the Si wafer and subsequently fabricate cross-linked organic nano-particles by using PEG-diacrylate (PolyEthylene Glycol diacrylate). Such organic nano-matrices would be potentially useful as therapeutic agent carriers, imaging chemical encapsulants and localized drug delivery vehicles.

Paper Details

Date Published: 24 March 2006
PDF: 6 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513C (24 March 2006); doi: 10.1117/12.656510
Show Author Affiliations
Ashish A. Pandya, Univ. of North Carolina (United States)
Benjamin W. Maynor, Univ. of North Carolina (United States)
Stephanie E. A. Gratton, Univ. of North Carolina (United States)
David G. Vellenga, North Carolina State Univ. (United States)
D. Ginger Yu, North Carolina State Univ. (United States)
Carlton M. Osburn, North Carolina State Univ. (United States)
Joseph M. DeSimone, Univ. of North Carolina (United States)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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