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Proceedings Paper

Design and optimization of collectors for extreme ultraviolet lithography
Author(s): Fabio E. Zocchi; Enrico Buratti; Valentino Rigato
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Paper Abstract

The design and optimization of nested grazing incidence collectors for extreme ultra-violet lithography is discussed taking into account the boundary conditions set by optical, mechanical, thermal, and manufacturing requirements. The trend of the collection efficiency as a function of numerical the aperture at the intermediate focus, the source-optics distance and the focal length is presented. The effect of the thickness of the mirrors on the optical performance and stability under thermal load is also discussed as a specific example involving optical, thermal and manufacturing issues. As an introduction to the discussion of the design and optimization of the collector, a theoretical maximum limit for the collection efficiency is studied as a function of collected solid angle and system etendue.

Paper Details

Date Published: 23 March 2006
PDF: 11 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510T (23 March 2006); doi: 10.1117/12.656417
Show Author Affiliations
Fabio E. Zocchi, Media Lario Technologies (Italy)
Enrico Buratti, Media Lario Technologies (Italy)
Valentino Rigato, Media Lario Technologies (Italy)
Lab. Nazionali di Legnaro, INFN (Italy)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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