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Proceedings Paper

Visible light point-diffraction interferometer for testing of EUVL optics
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Paper Abstract

We have built a visible light point-diffraction interferometer with the purpose to characterize EUVL projection optics. The interferometer operates at the wavelength of 532 nm and utilizes two identical pinhole wavefront reference sources for generation of both signal and reference wavefronts. In the simple configuration of our interferometer, the main source of system error is the pinhole reference wavefronts. It is important that the reference wavefronts are calibrated and the calibration is stable. The calibration using our refractive test optic is reproducible to better than 0.1 nm RMS. The interferometer measured the wavefront of our refractive test optic with the repeatability of 0.1nm RMS. This paper will discuss the error sources and removal of the errors with experimental results.

Paper Details

Date Published: 22 March 2006
PDF: 8 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510E (22 March 2006); doi: 10.1117/12.656275
Show Author Affiliations
Seiji Takeuchi, Canon Inc. (Japan)
Osamu Kakuchi, Canon Inc. (Japan)
Kenji Yamazoe, Canon Inc. (Japan)
Yoshio Gomei, Canon Inc. (Japan)
Todd A. Decker, Lawrence Livermore National Lab. (United States)
Michael A. Johnson, Lawrence Livermore National Lab. (United States)
Donald W. Phillion, Lawrence Livermore National Lab. (United States)
John S. Taylor, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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