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Characterization and selection of resist/topcoat and resist/fluid compatibilities
Author(s): Philippe Bandelier; Anne-Laure Charley; Claire Sourd; Gaelle Chamiot-Maitral; Alexandre Lagrange; Olivier Lartigue
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Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, ; doi: 10.1117/12.656258
Show Author Affiliations
Philippe Bandelier, CEA-LETI (France)
Anne-Laure Charley, STMicroelectronics (France)
Claire Sourd, CEA-LETI (France)
Gaelle Chamiot-Maitral, CEA-LETI (France)
Alexandre Lagrange, CEA-LETI (France)
Olivier Lartigue, CEA-LETI (France)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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