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Proceedings Paper

Technology mapping technique for throughput enhancement of character projection equipment
Author(s): Makoto Sugihara; Taiga Takata; Kenta Nakamura; Ryoichi Inanami; Hiroaki Hayashi; Katsumi Kishimoto; Tetsuya Hasebe; Yukihiro Kawano; Yusuke Matsunaga; Kazuaki Murakami; Katsuya Okumura
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Paper Abstract

The character projection is utilized for maskless lithography and is a potential for the future photomask manufacture. The drawback of the character projection is its low throughput and leads to a price rise of ICs. This paper discusses a technology mapping technique for enhancing the throughput of the character projection. The number of EB shots to draw an entire chip determines the fabrication time for the chip. Reduction of the number of EB shots, therefore, increases the throughput of character projection equipment and reduces the cost to produce ICs. Our technology mapping technique aims to reduce the number of EB shots to draw an entire chip for increasing the throughput of character projection equipment. Our technique treats the number of EB shots as an objective to minimize. Comparing with an conventional technology mapping, our technology mapping technique achieved 19.6% reduction of the number of EB shots without any performance degradation of ICs. Moreover, our technology mapping technique achieved 48.8% reduction of the number of EB shots under no performance constraints. Our technique is easy for both IC designers and equipment developers to adopt because it is a software approach with no additional modification on character projection equipment.

Paper Details

Date Published: 23 March 2006
PDF: 12 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510Z (23 March 2006); doi: 10.1117/12.656153
Show Author Affiliations
Makoto Sugihara, ISIT (Japan)
Taiga Takata, Kyushu Univ. (Japan)
Kenta Nakamura, Kyushu Univ. (Japan)
Ryoichi Inanami, e-Beam Corp. (Japan)
Hiroaki Hayashi, Tokyo Electron Ltd. (Japan)
Katsumi Kishimoto, e-Beam Corp. (Japan)
Tetsuya Hasebe, Tokyo Electron Ltd. (Japan)
Yukihiro Kawano, e-Beam Corp. (Japan)
Yusuke Matsunaga, Kyushu Univ. (Japan)
Kazuaki Murakami, Kyushu Univ. (Japan)
Katsuya Okumura, The Univ. of Tokyo (Japan)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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