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Proceedings Paper

Impact of line width roughness on device performance
Author(s): G. F. Lorusso; L. H. A. Leunissen; C. Gustin; A. Mercha; M. Jurczak; H. M. Marchman; A. Azordegan
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Paper Abstract

Although various approaches can be used to quantify linewidth roughness (LWR), it is essential to determine it with sufficient confidence. Statistical fluctuations inherent to the measurement process are making correlation between performance and LWR challenging. To reduce uncertainty, line width variations and LWR need to be monitored online in full automation by CDSEM. In this paper, we use this methodology to investigate the effect of LWR on electrical performance for various device applications. Our results quantify the impact of LWR by using matching techniques.

Paper Details

Date Published: 24 March 2006
PDF: 7 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520W (24 March 2006); doi: 10.1117/12.656128
Show Author Affiliations
G. F. Lorusso, IMEC (Belgium)
L. H. A. Leunissen, IMEC (Belgium)
C. Gustin, IMEC (Belgium)
A. Mercha, IMEC (Belgium)
M. Jurczak, IMEC (Belgium)
H. M. Marchman, Photronics Inc. (United States)
A. Azordegan, KLA-Tencor (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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