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Proceedings Paper

NIL template manufacturing using a variable shaped e-beam writer and a new pCAR
Author(s): Mathias Irmscher; Joerg Butschke; Guenter Hess; Corinna Koepernik; Florian Letzkus; Markus Renno; Holger Sailer; Hubert Schulz; Anatol Schwersenz; Ecron Thompson
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Paper Abstract

A resolution of 45nm dense lines has been be realized in a 100nm thick commercial available positive tone chemically amplified resist (pCAR) using the Leica SB350 variable shaped beam writer. On the basis of this resist process and by optimization of photomask blank material as well as by adaptation of chrome and quartz etching processes, a nanoimprint template technology has been developed which enables patterning of 50nm dense lines. The sensitivity of the selected pCAR as well as the performance of the implemented dynamical stage control of the Leica pattern generator, facilitates an acceptable throughput even for complex pattern. We characterized the templates in terms of feature profile, CD linearity and pattern fidelity. The final imprinting of different pattern proved the applicability of the manufactured stamps for the nanoimprint technology.

Paper Details

Date Published: 23 March 2006
PDF: 12 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615115 (23 March 2006); doi: 10.1117/12.656108
Show Author Affiliations
Mathias Irmscher, IMS Chips (Germany)
Joerg Butschke, IMS Chips (Germany)
Guenter Hess, Schott Lithotec (Germany)
Corinna Koepernik, IMS Chips (Germany)
Florian Letzkus, IMS Chips (Germany)
Markus Renno, Schott Lithotec (Germany)
Holger Sailer, IMS Chips (Germany)
Hubert Schulz, Carl Zeiss SMT AG (Germany)
Anatol Schwersenz, IMS Chips (Germany)
Ecron Thompson, Molecular Imprints, Inc. (United States)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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