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Proceedings Paper

Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source
Author(s): T. Inoue; P. E. Nica; K. Kaku; A. Shimoura; S. Amano; S. Miyamoto; T. Mochizuki
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Paper Abstract

In this paper, characterizations of a cryogenic Xe capillary jet target for a laser-produced plasma extreme ultraviolet (EUV) light source are reported. The capillary jet target is a candidate of fast-supplying targets for mitigating debris generation and target consumption in a vacuum chamber without reducing the EUV conversion efficiency. Xe capillary jets (jet velocity ~ 0.4 m/s) were generated in vacuum by using annular nozzles chilled to ~ 170 K at a Xe backing pressure of ~ 0.7 MPa. Forming mechanisms of the capillary jet targets were studied by using numerical calculations. Furthermore, laser-produced plasma EUV generation was performed by irradiating a Nd:YAG laser (1064 nm, ~ 0.5 J, 10 ns, 120 μmφ, ~ 4×1011 W/cm2) on a Xe capillary jet target (outer / inner diameter = 100 / 70 μmφ). The angular distribution of EUV generation was approximately uniform around the Xe capillary jet target, and the peak kinetic energy of the fast-ions was evaluated to be ~ 2 keV.

Paper Details

Date Published: 24 March 2006
PDF: 9 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513U (24 March 2006); doi: 10.1117/12.656096
Show Author Affiliations
T. Inoue, Univ. of Hyogo (Japan)
P. E. Nica, Univ. of Hyogo (Japan)
K. Kaku, Univ. of Hyogo (Japan)
A. Shimoura, Univ. of Hyogo (Japan)
S. Amano, Univ. of Hyogo (Japan)
S. Miyamoto, Univ. of Hyogo (Japan)
T. Mochizuki, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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