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Proceedings Paper

Fractal model applied wavefront aberration for the expression of local flare
Author(s): Toshiharu Nakashima; Taro Ogata
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Paper Abstract

Various inputs representing exposure tool will be required for the advanced OPC in the future. Among them, local flare is difficult to account in OPC because of difficulty to make accurate model it and incorporate it in imaging simulations. In this paper we introduce a method to input the local flare in the simulations. It applies fractal model to the PSD of wavefront aberration, and it generates a model wavefront expressing local flare. This model wavefront is consistent with the disappearing pad experiments. The impact of local flare on the OPC is estimated by the imaging simulation involving the generated model wavefront.

Paper Details

Date Published: 20 March 2006
PDF: 10 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615433 (20 March 2006); doi: 10.1117/12.656080
Show Author Affiliations
Toshiharu Nakashima, Nikon Corp. (Japan)
Taro Ogata, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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