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Proceedings Paper

High-refractive-index fluids for the next-generation ArF immersion lithography
Author(s): Yong Wang; Takashi Miyamatsu; Taiichi Furukawa; Kinji Yamada; Tetsuo Tominaga; Yutaka Makita; Hiroki Nakagawa; Atsushi Nakamura; Motoyuki Shima; Shiro Kusumoto; Tsutomu Shimokawa; Katsuhiko Hieda
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Paper Abstract

ArF immersion lithography using a high-refractive-index fluid (HIF) is considered to be a promising candidate for the 32nm node or below. At SPIE 2005 we introduced a new immersion fluid, JSR HIL-1, which has a refractive index and transmittance of 1.64 and >98%/mm (193.4nm, 23 oC), respectively. With HIL-1 immersion and a two beam interferometric exposure tool, hp32nm L/S imaging has been demonstrated. In this paper, we will report another novel immersion fluid, HIL-2, which has a transmittance of >99%/mm, which is almost as high as that of water, and a refractive index of 1.65 (193.4nm, 23 oC). Furthermore, an ArF laser irradiation study has shown that the degree of photodecomposition for both HIL-1 and HIL-2 is small enough for immersion lithography application. A "fluid puddle" defect study confirmed that HILs have less tendency to form immersion-specific photoresist defects and the refractive indices of HILs were found constant under laser irradiation. Batch-to-batch variation in refractive index during manufacture of HILs was not observed. By refining prism designs, hp30nm L/S patterns have also been successfully imaged with two interferometric exposure tools and HIL immersion.

Paper Details

Date Published: 11 April 2006
PDF: 9 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61530A (11 April 2006); doi: 10.1117/12.656022
Show Author Affiliations
Yong Wang, JSR Corp. (Japan)
Takashi Miyamatsu, JSR Corp. (Japan)
Taiichi Furukawa, JSR Corp. (Japan)
Kinji Yamada, JSR Corp. (Japan)
Tetsuo Tominaga, JSR Corp. (Japan)
Yutaka Makita, JSR Corp. (Japan)
Hiroki Nakagawa, JSR Corp. (Japan)
Atsushi Nakamura, JSR Corp. (Japan)
Motoyuki Shima, JSR Corp. (Japan)
Shiro Kusumoto, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)
Katsuhiko Hieda, JSR Corp. (Japan)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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