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Proceedings Paper

Application of high-refractive index fluid to KrF-immersion lithography
Author(s): Yuji Yada; Koji Ito; Yoshikazu Yamaguchi; Taiichi Furukawa; Takashi Miyamatsu; Yong Wang; Katsuhiko Hieda; Tsutomu Shimokawa
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Paper Abstract

This paper describes the material characteristics for KrF-immersion lithography with a high refractive index fluid. We have obtained promising results in soaking experiments involving KrF lithography without topcoat film. Although water is currently used as the immersion fluid in 193nm lithography, providing suitable refractive index (n=1.44@193nm and n=1.37@248nm) and transmittance (>99%/mm), it is found to have leaching issues when used with KrF resist. On the other hand, our high refractive index fluid (JSR-HIL-001), which was developed for ArF immersion purposes, satisfies the following requirements: HIL-001 has indicated promising characteristics as a 248nm-immmersion fluid. The refractive index is 1.54@248nm and the transmittance is >99%/mm. In this paper the physical and chemical properties of HIL-001 for KrF-immersion fluid application are discussed in detail.

Paper Details

Date Published: 11 April 2006
PDF: 9 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61531W (11 April 2006); doi: 10.1117/12.655983
Show Author Affiliations
Yuji Yada, JSR Corp. (Japan)
Koji Ito, JSR Corp. (Japan)
Yoshikazu Yamaguchi, JSR Corp. (Japan)
Taiichi Furukawa, JSR Corp. (Japan)
Takashi Miyamatsu, JSR Corp. (Japan)
Yong Wang, JSR Corp. (Japan)
Katsuhiko Hieda, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)

Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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