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Proceedings Paper

A character projection low energy electron beam direct writing system for device of small production lot with a variety of design
Author(s): Fumihiko Nakamura; Katsuhide Watanabe; Hidetoshi Kinoshita; Hiroyuki Shinozaki; Yasushi Kojima; Satoshi Morita; Kouhei Noguchi; Norihiro Yamaguchi; Hisashi Isokawa; Kazuhiko Kushitani; Takayuki Satoh; Takeshi Koshiba; Takumi Oota; Tetsuro Nakasugi; Hiroyuki Mizuno
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Paper Abstract

A character projection (CP)-type, low energy, electron beam direct writing (EBDW) system, for quick-turn-around-time and mask-less device fabrications of small production lots featuring a variety of designs has been developed. This system, named the EBIS (Electron Beam Integrated System), can satisfy a set of requirements for EBDWs, including higher throughput and mask-less exposure. A standardized CP aperture method that enables reduction in the number of EB shots without frequent aperture making has been applied as a means for attaining effective CP and mask-less fabrication. This breakthrough was able to be realized only by using low energy EB with the advantage of the free proximity effect. To resolve critical low energy EB issues, a compact EB column, equipped with monolithic deflectors and lenses for restricting beam blur caused by Coulomb interaction, was developed and put to use. Sufficient resolution, corresponding to 100 nm L/S patterns, was attained by using a thin-layered resist process. As the mark detection method, voltage contrast imaging using a micro channel plate was used. This method made it possible to detect buried marks when using low energy EB. The authors are currently verifying the basic performance of this EBIS. This paper outlines and discusses geometrical details and performance data of this system.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512A (24 March 2006); doi: 10.1117/12.655963
Show Author Affiliations
Fumihiko Nakamura, e-BEAM Corp. (Japan)
Katsuhide Watanabe, e-BEAM Corp. (Japan)
Hidetoshi Kinoshita, e-BEAM Corp. (Japan)
Hiroyuki Shinozaki, e-BEAM Corp. (Japan)
Yasushi Kojima, e-BEAM Corp. (Japan)
Satoshi Morita, e-BEAM Corp. (Japan)
Kouhei Noguchi, e-BEAM Corp. (Japan)
Norihiro Yamaguchi, e-BEAM Corp. (Japan)
Hisashi Isokawa, e-BEAM Corp. (Japan)
Kazuhiko Kushitani, e-BEAM Corp. (Japan)
Takayuki Satoh, e-BEAM Corp. (Japan)
Takeshi Koshiba, Toshiba Corp. (Japan)
Takumi Oota, Toshiba Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)
Hiroyuki Mizuno, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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