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Proceedings Paper

Adhesion between template materials and UV-cured nanoimprint resists
Author(s): Frances A. Houle; Eric Guyer; Dolores C. Miller; Reinhold Dauskardt; Emily Rice; Jeremy Hamilton
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Paper Abstract

The origins of defects in lithographic stencils fabricated by the UV-cure nanoimprint technique include fundamental surface interactions between template and resist in addition to the presence of particles and contaminants. Repeated, molecularly clean separations of the template from the newly cured resist is a requirement, yet rather little is understood about the separation process or underlying interfacial physics and chemistry. We have investigated the chemical and physical interactions of several model acrylate nanoimprint resist formulations cured in contact with clean and release-treated quartz surfaces, then separated from them. The results show that fracture energies are resist formulation-dependent, that the resist-release layer systems studied are not chemically stable and that release process is more complex than simple fracture at a glass-organic interface.

Paper Details

Date Published: 29 March 2006
PDF: 8 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61531B (29 March 2006); doi: 10.1117/12.655698
Show Author Affiliations
Frances A. Houle, IBM Almaden Research Ctr. (United States)
Eric Guyer, Stanford Univ. (United States)
Dolores C. Miller, IBM Almaden Research Ctr. (United States)
Reinhold Dauskardt, Stanford Univ. (United States)
Emily Rice, Stanford Univ. (United States)
Jeremy Hamilton, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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