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Proceedings Paper

Optical properties of high-index lens materials for ArF hyper-NA immersion systems
Author(s): Lutz Parthier; Gunther Wehrhan; Michael Selle; Gordon von der Gönna; Dietmar Keutel; Konrad Knapp
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Date Published:
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Proc. SPIE 6154, Optical Microlithography XIX, 615419; doi: 10.1117/12.655613
Show Author Affiliations
Lutz Parthier, SCHOTT Lithotec AG (Germany)
Gunther Wehrhan, SCHOTT Lithotec AG (Germany)
Michael Selle, SCHOTT Lithotec AG (Germany)
Gordon von der Gönna, SCHOTT Lithotec AG (Germany)
Dietmar Keutel, SCHOTT Lithotec AG (Germany)
Konrad Knapp, SCHOTT Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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