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Proceedings Paper

Macro analysis of line edge and line width roughness
Author(s): Jangho Shin; Jinyoung Yoon; Youngjae Jung; SukJoo Lee; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon
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Paper Abstract

Line edge and line width roughness (LER/LWR) is commonly estimated by standard deviation sigma. Since the standard deviation is a function of sample line length L, the behavior of sigma(L) curve is characterized by the correlation length and roughness exponent. In this paper, an efficient and practical macro LER/LWR analysis is implemented by characterizing an arbitrary array of similar features within a single CD-SEM image. A large amount of statistical data is saved from a single scan image. As a result, it reports full LER/LWR information including correlation length, roughness exponent, sigma at infinite line length, and power spectrum. Off-line, in-house software is developed for automated investigation, and it is successfully evaluated against various patterns. Starting with the detailed description of the algorithm, experimental results are discussed.

Paper Details

Date Published: 24 March 2006
PDF: 7 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520X (24 March 2006); doi: 10.1117/12.655516
Show Author Affiliations
Jangho Shin, Samsung Electronics Co., Ltd. (South Korea)
Jinyoung Yoon, Samsung Electronics Co., Ltd. (South Korea)
Youngjae Jung, Samsung Electronics Co., Ltd. (South Korea)
SukJoo Lee, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Han-Ku Cho, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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