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Proceedings Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography
Author(s): Satoshi Tanaka; Hiroaki Tsushima; Takanori Nakaike; Taku Yamazaki; Takashi Saito; Hitoshi Tomaru; Koji Kakizaki; Takashi Matsunaga; Toru Suzuki; Osamu Wakabayashi; Shinji Nagai; Junichi Fujimoto; Toyoharu Inoue; Hakaru Mizoguchi
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Paper Abstract

Last year Gigaphoton introduced a 45-W ArF excimer laser, model GT40A, to semiconductor markets as a light source for 65 nm lithography generation. The GT40A is based on injection lock technology with G-electrode, magnetic bearing and high resolution technologies for high reliability and long lifetime. As a result, GT40A showed the stable performance during the chamber maintenance interval of over 15 billion pulses. In this paper we will report the longterm stability of GT40A.

Paper Details

Date Published: 15 March 2006
PDF: 8 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61542O (15 March 2006); doi: 10.1117/12.655474
Show Author Affiliations
Satoshi Tanaka, Gigaphoton Inc. (Japan)
Hiroaki Tsushima, Gigaphoton Inc. (Japan)
Takanori Nakaike, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Takashi Saito, Gigaphoton Inc. (Japan)
Hitoshi Tomaru, Gigaphoton Inc. (Japan)
Koji Kakizaki, Ushio Inc. (Japan)
Takashi Matsunaga, Komatsu Ltd. (Japan)
Toru Suzuki, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Shinji Nagai, Komatsu Ltd. (Japan)
Junichi Fujimoto, Komatsu Ltd. (Japan)
Toyoharu Inoue, Ushio Inc. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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