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Proceedings Paper

Resist dissolution behavior according to protecting group in polymer
Author(s): Kwanghwyi Im; Jin Jegal; Jungkook Park; Deogbae Kim; Jaehyun Kim
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Paper Abstract

In DUV CAR resists, deprotecting reaction and dissolution behavior depend upon the bulkiness and activation energy of protecting group. These factors have influences on resist performance (resolution, focus and exposure latitude margin, line width roughness). For further understanding this behavior, we investigated the dissolution parameters of resist related to the bulkiness, activation energy of protecting group, and we confirmed their effects on the resist performance using lithography evaluation. We will report and discuss the effect of structure and chemical properties of each protecting group on the dissolution behavior of resist in detail in this paper.

Paper Details

Date Published: 29 March 2006
PDF: 11 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533Q (29 March 2006); doi: 10.1117/12.655458
Show Author Affiliations
Kwanghwyi Im, Dongjin Semichem Inc., Ltd. (South Korea)
Jin Jegal, Dongjin Semichem Inc., Ltd. (South Korea)
Jungkook Park, Dongjin Semichem Inc., Ltd. (South Korea)
Deogbae Kim, Dongjin Semichem Inc., Ltd. (South Korea)
Jaehyun Kim, Dongjin Semichem Inc., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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