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Proceedings Paper

An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)
Author(s): Andrew J. Dallas; Lefei Ding; Jon Joriman; Brian Hoang; Kevin Seguin; Dustin Zastera
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Paper Abstract

Molecular bases have long been known to be a problem in photolithographic applications using chemically amplified photoresists. Of these molecular bases, ammonia and 1-methyl-2-pyrrolidinone (NMP) have been studied in the most detail since chemical filtration of these contaminants is critical to the success of the photolithographic process. It has been well documented that ammonia is best removed through chemisorptive reactions using acid impregnated adsorbents or strong acid ion exchange resins. However, the mechanism(s) for the removal of NMP has not been investigated to any significant extent. There are several chemical filtration systems available that employ activated carbon, impregnated activated carbon, or ion exchange resins for the removal of NMP. This work investigates the removal of NMP using several different types of adsorbents and rationalizes the adsorption mechanism which is operative in each situation.

Paper Details

Date Published: 24 March 2006
PDF: 17 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523R (24 March 2006); doi: 10.1117/12.654839
Show Author Affiliations
Andrew J. Dallas, Donaldson Co., Inc. (United States)
Lefei Ding, Donaldson Co., Inc. (United States)
Jon Joriman, Donaldson Co., Inc. (United States)
Brian Hoang, Donaldson Co., Inc. (United States)
Kevin Seguin, Donaldson Co., Inc. (United States)
Dustin Zastera, Donaldson Co., Inc. (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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