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Proceedings Paper

Automatic CD-SEM offline recipe creation for OPC qualification and process monitoring in a DRAM pilot-fab environment
Author(s): Uwe Kramer; Thomas Marschner; Dieter Kaiser; Marc Winking; Christian Stief; Stefano Ventola; Dan Lewitzki; Zamir Abraham; Ovadya Menadeva; Sam Shukrun
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Paper Abstract

In our work we discuss two approaches of offline CD-SEM recipe creation for both OPC qualification wafers and the introduction of new products to the manufacturing line using the Applied Materials OPC Check and Offline Recipe Editor (ORE) applications. We evaluate the stability of the offline created recipes against process variations for different OPC test layouts as well as for production measurements on multiple lots per week and compare the results to the performance of recipes created directly on the tool. Further, the success rate of recipe creation is evaluated. All offline recipes have been generated in advance of wafer availability using GDS data. The offline created recipes have shown pattern recognition success rates of up to 98% and measurement success rates of up to 99% for line/space as well as for contact-hole (CH) measurements without manual assists during measurement. These success rates are in the same order of magnitude as the rates typically reached by an experienced CD-SEM engineer creating the recipes directly on the tool.

Paper Details

Date Published: 24 March 2006
PDF: 6 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520L (24 March 2006); doi: 10.1117/12.654787
Show Author Affiliations
Uwe Kramer, Infineon Technologies SC300 GmbH & Co. OHG (Germany)
Thomas Marschner, Infineon Technologies SC300 GmbH & Co. OHG (Germany)
Dieter Kaiser, Infineon Technologies SC300 GmbH & Co. OHG (Germany)
Marc Winking, Infineon Technologies AG Munich (Germany)
Christian Stief, Applied Materials GmbH (Germany)
Stefano Ventola, Applied Materials GmbH (Germany)
Dan Lewitzki, Applied Materials Israel (Israel)
Zamir Abraham, Applied Materials Israel (Israel)
Ovadya Menadeva, Applied Materials Israel (Israel)
Sam Shukrun, Applied Materials Israel (Israel)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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