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Proceedings Paper

Non-destructive micro-patterning of protein crystals by focused femtosecond laser
Author(s): Y. Hosokawa; T. Kaji; Y. Hiraki; H. Mori; H. Masuhara
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Paper Abstract

Micro-patterning of proteins has been attracted much attention as a potential technique to realize bio-microdevice. In this work, as a new method to realize non-destructive micro-patterning of proteins, laser transfer printing for a um-sized protein crystal was developed by utilizing focused femtosecond laser. The micro-patterning was performed to transfer the protein crystal which was adhered on a source substrate to a target substrate which was underlaid on the source substrate. An 800-nm femtosecond laser was focused in a water between the source and target substrates on an inverted microscope with a 100x objective lens. When the laser focal point was scanned at the position with distance of a few um far from the source substrate, the protein crystals were detached by a shockwave and cavitation bubble generation at the circumstance of the focal point and transferred to the target substrate forming a line pattern. The line width of the protein crystal was a few tens um with the scanning speed of 90 μm/sec. Furthermore, multi-patterning of several kinds of protein crystals was realized by this method. The pattering resolution is comparable or better than that by another multi-material transfer printing, such as ink jet printing, micro-printing, and laser direct writing.

Paper Details

Date Published: 28 February 2006
PDF: 9 pages
Proc. SPIE 6108, Commercial and Biomedical Applications of Ultrafast Lasers VI, 610805 (28 February 2006); doi: 10.1117/12.654706
Show Author Affiliations
Y. Hosokawa, Osaka Univ. (Japan)
CREST-JST (Japan)
T. Kaji, Osaka Univ. (Japan)
Y. Hiraki, Kyoto Univ. (Japan)
CREST-JST (Japan)
H. Mori, Kyoto Institute of Technology (Japan)
Protein Crystal Corp. (Japan)
CREST-JST (Japan)
H. Masuhara, Osaka Univ. (Japan)
CREST-JST (Japan)


Published in SPIE Proceedings Vol. 6108:
Commercial and Biomedical Applications of Ultrafast Lasers VI
Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer, Editor(s)

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