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Proceedings Paper

Microlens formation using heavily dyed photoresist in a single step
Author(s): Chris Cox; Curtis Planje; Nick Brakensiek; Zhimin Zhu; Jonathan Mayo
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Paper Abstract

The work described here produced a new method of forming microlenses which requires fewer processing steps, eliminates the need for reflow or photoresist etching steps, and can be used with an inexpensive mask to form arrays. In this new method, a strongly absorbing dye is added in high percentage to a normal positive i-line photoresist. This photoresist is then processed at a much higher exposure dose than the normal photoresist. This paper describes simulated microlens structures as predicted by PROLITH as well as actual lens structures that were produced with the new method. This newly developed method is designed to enable the formation of microlenses at significant cost savings and with increased process control.

Paper Details

Date Published: 11 April 2006
PDF: 7 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61534E (11 April 2006); doi: 10.1117/12.654531
Show Author Affiliations
Chris Cox, Brewer Science, Inc. (United States)
Curtis Planje, Brewer Science, Inc. (United States)
Nick Brakensiek, Brewer Science, Inc. (United States)
Zhimin Zhu, Brewer Science, Inc. (United States)
Jonathan Mayo, Brewer Science, Inc. (United States)

Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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