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Proceedings Paper

Liquid immersion lithography at 193 nm using a high-NA achromatic interferometer
Author(s): Anne-Laure Charley; Alexandre Lagrange; Olivier Lartigue; Philippe Bandelier; Marianne Derouard; Patrick Schiavone
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Paper Abstract

In this paper, we present an immersion interferometer specially designed to be used with a commercial ArF excimer laser. Different configurations are presented enabling the printing of dense lines with a pitch down to 65 nm with an acceptable depth-of-focus. Photoresist patterns are shown at a half-pitch down to 40 nm with nice squared profiles. First polarization studies at high-numerical aperture (NA) have been performed and we noticed a good correlation between roughness and polarization variation at high NA.

Paper Details

Date Published: 21 March 2006
PDF: 9 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61541Z (21 March 2006); doi: 10.1117/12.654404
Show Author Affiliations
Anne-Laure Charley, STMicroelectronics (France)
LTM, CNRS, CEA-LETI (France)
Alexandre Lagrange, DOPT/STCO, CEA-LETI (France)
Olivier Lartigue, DOPT/STCO, CEA-LETI (France)
Philippe Bandelier, D2NT/LLIT, CEA-LETI (France)
Marianne Derouard, STMicroelectronics (France)
DOPT/STCO, CEA-LETI (France)
Patrick Schiavone, LTM, CNRS, CEA-LETI (France)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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