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Proceedings Paper

Modeling the fabrication of nano-optical structures
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Paper Abstract

Over the last two decades, considerable research has been devoted to micro-optic and now nano-optical structures. Fabrication methods have become sufficiently mature to realize most concepts, but due to physics inherent in the process, geometry is distorted. Edges are rounded, sidewalls are sloped, surfaces are rough, and etching or deposition not uniform. Deviations from "perfect" geometry can dramatically affect optical behavior. In order to address the impact of the "non-perfect" nature of fabrication, numerical methods for modeling fabrication is discussed and quantified for various examples. As an example, comprehensive modeling of near-field nano-patterning is described. Numerical and experimental results are presented of three-dimensional photonic crystals fabricated in a contact mask aligner using a standard UV lamp as the source.

Paper Details

Date Published: 23 January 2006
PDF: 14 pages
Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 611004 (23 January 2006); doi: 10.1117/12.652604
Show Author Affiliations
Raymond C. Rumpf, College of Optics and Photonics, Univ. of Central Florida (United States)
Pradeep Srinivasan, College of Optics and Photonics, Univ. of Central Florida (United States)
Eric G. Johnson, College of Optics and Photonics, Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 6110:
Micromachining Technology for Micro-Optics and Nano-Optics IV
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

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