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Proceedings Paper

Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast
Author(s): Alex Lagrange; Anne Laure Charley; Olivier Lartigue; Marianne Derouard
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Paper Abstract

This document shows the modelization of the vibration effects on a hyper NA immersion interferometer at 193 nm, and their consequences on the image contrast. Finally we propose to use a active tabletop anti vibration unit and show its benefits.

Paper Details

Date Published: 21 March 2006
PDF: 5 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61544O (21 March 2006); doi: 10.1117/12.652227
Show Author Affiliations
Alex Lagrange, CEA-LETI (France)
Anne Laure Charley, STMicroelectronics / CNRS (France)
Olivier Lartigue, CEA-LETI (France)
Marianne Derouard, STMicroelectronics / CNRS (France)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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