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Proceedings Paper

Tools to measure CD-SEM performance
Author(s): Jihoon Kim; Kiran Jalhadi; Sachin Deo; Soo-Young Lee; David Joy
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Paper Abstract

It is important to be able to quantify the imaging performance of CD-SEMs for such purposes as verifying the specification, rechecking after a routine maintenance, or for tool matching. To perform tests such as these it is necessary to have both appropriate software for image analysis and suitable test samples. A package of 2-D Fourier transform and analysis software, designed as a plug-in for the shareware IMAGE-Java program, has been developed and is freely available on line. The requirement for a reproducible and well characterized sample has been met by using direct-write electron beam lithography to fabricate suitable Fresnel zone plate structures.

Paper Details

Date Published: 24 March 2006
PDF: 9 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520T (24 March 2006); doi: 10.1117/12.650649
Show Author Affiliations
Jihoon Kim, Univ. of Tennessee (United States)
Kiran Jalhadi, Univ. of Tennessee (United States)
Sachin Deo, Univ. of Tennessee (United States)
Soo-Young Lee, Auburn Univ. (United States)
David Joy, Univ. of Tennessee (United States)
Oak Ridge National Lab. (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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