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Proceedings Paper

Nanoimprint technology for application to photonic devices
Author(s): Masashi Nakao; Shiyoshi Yokoyama; Hideki Masuda
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Paper Abstract

We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.

Paper Details

Date Published: 6 December 2005
PDF: 8 pages
Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 605001 (6 December 2005); doi: 10.1117/12.649216
Show Author Affiliations
Masashi Nakao, NTT Photonics Labs. (Japan)
Shiyoshi Yokoyama, National Institute of Information and Communications Technology (Japan)
Hideki Masuda, Tokyo Metropolitan Univ. (Japan)


Published in SPIE Proceedings Vol. 6050:
Optomechatronic Micro/Nano Devices and Components
Yoshitada Katagiri, Editor(s)

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