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Proceedings Paper

Investigation of femtosecond laser irradiation on fused silica
Author(s): Yves Bellouard; Tristan Colomb; Christian Depeursinge; Ali A. Said; Mark Dugan; Philippe Bado
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Paper Abstract

Femtosecond laser irradiation has various noticeable effects on fused silica. It can locally increase the index of refraction and modify the material chemical selectivity. Regions that have been exposed to the laser are etched hundred fold faster than unexposed regions. These effects are of practical importance from an application point-of-view and open new opportunities for the development of integrated photonics devices that combine structural and optical functions. Various observations reported in the literature indicate that those effects are potentially related to a combination of both structural changes and the presence of internal stress. In this paper, we present further investigations on the effect of femtosecond laser irradiation on fused silica substrate (a-SiO2). In particular, we use nanoindentation and holography-based birefringence measurements, coupled with direct SEM observations on chemically etched specimens to characterize the effect of various laser parameters such as power, scanning speed and irradiation pattern. We show evidence of an interface between two different etching regimes that may be related to the presence of two different material phases induced by the laser irradiation.

Paper Details

Date Published: 28 February 2006
PDF: 9 pages
Proc. SPIE 6108, Commercial and Biomedical Applications of Ultrafast Lasers VI, 61080M (28 February 2006); doi: 10.1117/12.648389
Show Author Affiliations
Yves Bellouard, Technische Univ. Eindhoven (Netherlands)
Tristan Colomb, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Christian Depeursinge, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Ali A. Said, Translume Inc. (United States)
Mark Dugan, Translume Inc. (United States)
Philippe Bado, Translume Inc. (United States)


Published in SPIE Proceedings Vol. 6108:
Commercial and Biomedical Applications of Ultrafast Lasers VI
Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer, Editor(s)

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