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Proceedings Paper

High-fill factor micro-mirror array for multi object spectroscopy
Author(s): Severin Waldis; Pierre-Andre Clerc; Frederic Zamkotsian; Michael Zickar; Wilfried Noell; Nico de Rooij
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Paper Abstract

Programmable multi-slit masks are required for next generation Multi-Object Spectrograph (MOS) for space as well as for ground-based instruments. A promising solution is the use of MOEMS devices such as micromirror arrays (MMA) or micro-shutter arrays (MSA), which both allow the remote control of the multi-slit configuration in real time. In the present work we developed and microfabricated a novel micro mirror array suited for this application. The requirements are: high contrast, optically flat (λ/20) mirrors in operation, high fill factor, uniform tilt angle over the whole array and low actuation voltage. In order to fulfill these requirements we use a combination of bulk and surface micromachining in silicon. The mirrors are actuated electrostatically by a separate electrode chip. The mirrors are defined by deep reactive ion etching in the 10μm thick device layer of a silicon-on-insulator (SOI) wafer, whereas the suspension of the mirrors is defined by a patterned poly-silicon layer hidden on the backside of the mirrors. The mirror size is 100 x 200 μm2 and the dimensions of a typical cantilever suspension are 100 x 5 x 0.6 μm3. On a separate SOI wafer the electrodes and the spacers are processed by using a self aligned delayed mask process. The first results on the mirror chips show that the micromirrors can easily achieve the desired mechanical tilt angle of more than 20° associated with a good surface quality, which is necessary for a high contrast spectroscopy.

Paper Details

Date Published: 23 January 2006
PDF: 12 pages
Proc. SPIE 6114, MOEMS Display, Imaging, and Miniaturized Microsystems IV, 611408 (23 January 2006); doi: 10.1117/12.647493
Show Author Affiliations
Severin Waldis, Univ. of Neuchatel (Switzerland)
Pierre-Andre Clerc, Univ. of Neuchatel (Switzerland)
Frederic Zamkotsian, Lab. d’Astrophysique de Marseille (France)
Michael Zickar, Univ. of Neuchatel (Switzerland)
Wilfried Noell, Univ. of Neuchatel (Switzerland)
Nico de Rooij, Univ. of Neuchatel (Switzerland)

Published in SPIE Proceedings Vol. 6114:
MOEMS Display, Imaging, and Miniaturized Microsystems IV
Hakan Ürey; David L. Dickensheets; Bishnu P. Gogoi, Editor(s)

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