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Proceedings Paper

Scattering analysis of optical components in the DUV
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Paper Abstract

Driven by the increasing demands on optical components for DUV lithography, a system for angle resolved as well as total scatter measurements (ARS and TS respectively) at 193 nm and 157 nm has been developed at the Fraunhofer Institute in Jena. Extremely low background scattering levels of 10-6 for the TS measurements and more than 12 orders of magnitude dynamic range for ARS have been accomplished. The variety of components to be measured extends from super-smooth substrates with sub-nanometer roughness to multilayer systems with pronounced nanostructures. Examples are presented for scatter analysis of DUV dielectric multilayers as well as for roughness analysis of super-smooth EUV mirrors.

Paper Details

Date Published: 23 February 2006
PDF: 10 pages
Proc. SPIE 6101, Laser Beam Control and Applications, 61011H (23 February 2006); doi: 10.1117/12.647416
Show Author Affiliations
Sven Schröder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Stefan Gliech, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Angela Duparré, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

Published in SPIE Proceedings Vol. 6101:
Laser Beam Control and Applications
Steven J. Davis; Alexis V. Kudryashov; Adolf Giesen; Detlef Nickel; Michael C. Heaven; Alan H. Paxton; Vladimir S. Ilchenko; J. Thomas Schriempf, Editor(s)

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